The main production process of quartz glass tube Ⅲ

The main production process of quartz glass tube Ⅲ
The main production process of quartz glass tube Ⅲ
SiCl4 or SiHCl3 of chemical raw material is used as raw material to decompose and hydrolyze SiCl4+H2+ O2 to SiCl4+H2O to 4HCl+ SiO2 in hydrogen oxygen flame or plasma flame. At this time SiO2 is a smog like product deposited on the surface of quartz and made into a quartz lump, which is re cooled to a optical product and a resistance furnace. Pull, pull rod. The product has high purity, and the total amount of metal impurities is 1-5ppm. But the base content is up to 1200ppm. As the optical product of quartz glass tube, the ultraviolet transmittance is good and the radiation resistance is very good. It can be used in technology and precision optical instrument.
The two step process is to synthesize the two processes of gas smelting and electrofusion, that is, the production of quartz Tuo by vacuum resistance furnace, and then two times in the quartz Tuo resistance furnace, which can be drawn into 80-? 150mm large diameter quartz glass tube tube, which is used for semiconductor technology.
Doping process quartz glass tube is a single component of SiO2, which has so many excellent properties. Doping is to absorb ultraviolet light. Some products, such as laser lamp, ozone free lamp, etc., want quartz glass tube to absorb a certain band of ultraviolet light and retain other properties of quartz glass tube. Several specific absorption of ultraviolet light, such as: Ti, Ce, Eu and other elements, and the amount is very small, generally only a few to several hundred to hundreds of ppm (1000ppm=1%), so the general amount of doping is 0.05%-0.2%.

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The main production process of quartz glass tube

Quartz Tube	Clear Quartz Glass Tube	Quartz Glass Pipe	Thin Glass Tube
Quartz Tube	Clear Quartz Glass Tube	Quartz Glass Pipe	Thin Glass Tube
Quartz Tube	Clear Quartz Glass Tube	Quartz Glass Pipe	Thin Glass Tube