The main cleaning methods for quartz wafers
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The main cleaning methods for quartz wafers include:
In the use of quartz wafers, surface cleaning and treatment is an important link. Because the surface of the sheet is prone to metal, particle and organic pollutants, it must be cleaned effectively before use. At present, the commonly used cleaning methods are chemical cleaning, mechanical scrubbing, ultrasonic cleaning, mega-acoustic cleaning, rotary spraying, ozone cleaning, laser cleaning and so on.
Ultrasound cleaning method and chemical cleaning method are mainly used in the laboratory. Chemical cleaning methods include concentrated sulfuric acid/hydrogen peroxide, ammonia/hydrogen peroxide, and concentrated hydrochloric acid/hydrogen peroxide. Its cleaning effect mainly includes two aspects: on the one hand, removing surface contaminants; on the other hand, hydrophilic treatment of the surface, forming a large number of hydroxyl groups on the surface of the sheet, providing binding sites for the bonding between the sheet and other molecules.
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