Study on Chemical Polishing Process of Quartz Glass Sheet

Quartz glass is a key optical element in precision optical systems such as ultraviolet lithography and laser nuclear technology. Quartz glass is prone to surface and subsurface damage and pitting during processing. Chemical polishing can effectively eliminate subsurface damage of quartz glass. The principle and process of chemical polishing of quartz glass sheet are introduced. The process parameters of chemical polishing of quartz glass are optimized by orthogonal experimental method. The effects of polishing liquid composition, polishing liquid temperature and polishing time on the surface roughness of quartz glass sheet during chemical polishing are analyzed. The experimental results show that when the chemical polishing liquid prepared by ammonium bifluoride, water and propylene glycol is used, the surface roughness of quartz glass sheet can be reduced to about 100 nm after chemical polishing, and the visible light transmittance can reach up to 89% at the most optimized process parameters. It provides theoretical basis and technical support for the chemical polishing process of quartz glass optical parts.